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AATCC CITDA Symposium slated for June 14-15 at FIT

13 Mar '07
2 min read

Optimizing Design through Software and Technology is the theme for AATCC's second CITDA symposium to be held June 14-15 at the Fashion Institute of Technology in New York City.

The symposium will target CAD designers, CAM managers, textile and apparel designers, stylists, design technology providers, academia, and fashion and home furnishings management.

Presentations confirmed to date include:
- Custom Fit Custom Print – Ceri Isaac, London College of Fashion- Business Transformation and Technology: You Can't Have One without the Other – Nancy Johnson, Optimyze LLC
- Step Forward into Reality – Daphne O'Brien, International Textile Group
- Digital Printing: What's Possible, What's Not and How To Make It Work For You – Barbara Burger, Fabrics 2 Dye 4
- Images & Data Management Solutions: Helping to Efficiently Support the Development Process – Christine Jean-Struss, Lectra
- ORGANIC: “Luxury Concept” – Paula Zanger, Paula Zanger Design
- Fashion Summer Study at the Paris American Academy in Paris – Mary Ruppert, Stephens College
- Lace CAD Systems – Oliver Meier, EAT Inc

A roundtable discussion will address the pros and cons of off-the-shelf and proprietary software. Brief infomercials from suppliers of CAD/CAM software and technology as well as data and color management systems will be offered prior to the opening of the tabletop displays.

American Association of Textile Chemists and Colorists

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