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Trend Spotting is the theme of FIT Tech Day
28
Mar '09
The second annual Tech Day conference will be held Friday, April 17th in the John E. Reeve's Conference Center at the Fashion Institute of Technology, Seventh Avenue at 27th Street in New York City.

This year the theme is "Trend Spotting" and will focus on FIT's diverse and unique use of technology in all the disciplines. The conference will provide teaching professionals with the most up-to-date technology, tools, trends and strategies for the classroom featuring workshops and presentations centered on existing and emerging hardware and software in the following tracks:
• Use of technology in the classroom
• Business and Technology - professional application for training and development
• Art and Design - imaging/design and multimedia technology software/hardware used
in the fine arts

Special Events Feature:
"Trading Places" Coordinator: Melanie Reim, Assistant Professor, School of Art and Design Chair, Illustration, School of Graduate Studies. (Sponsored by Adobe Connect and School of Art & Design, FIT).

"Developing Knit Fabrics on Stoll's M1 CAD System" A guided tour for FIT's Knitting Lab and lecture by Ann Denton Assistant Professor of Textile Development & Marketing, FIT with special guest Stoll.

This year we are thrilled to gain the support of the following exhibitors and sponsors:
Microsoft, Adobe, Apple, Dell, Xythos, Gerber Technology, Presidium Learning, Shape Media, H. Stoll GmbH & Co. KG, Lectra Inc., OptiTex.

Fashion Institute of Technology

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